真空镀二硫化钼涂层性能优势 ·Coating deposition carried out using a high density of low energy bombarding ions. 使用高密度低能量轰击离子进行沉积镀膜。 ·Deposition of very dense, non-columnar coating structures with low internal stresses. 镀层致密度好，低柱状晶结构，内应力低 ·Deposition of coatings with dense structures at low temperatures. • 可在低温环境下沉积致密结构的镀层 ·High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion. 高效率等离子清理以提供高的镀层结合强度。 ·Coatings quality is assured by the use of specially designed Plasmagsputter sources, which create an intense plasma and high ion bombardment of work pieces. 镀层品质保证是由使用专门设计plasmag溅射源及提供高密度的等离子。
